We take all necessary measures to protect our customers, business partners and employees against Coronavirus. Please enter the AP&S building wearing a mask suitable for everyday use. If you feel ill or unwell, please send another person from your organization to the appointment or postpone the appointment.
We overcome every obstacle and move even mountains just to reach our aim, which is to keep your wafers clean! Because wet process technology is our passion. We are rooted in the Black Forest and at home in the semiconductor market worldwide. Let's shape the future of the semiconductor production together!
AP&S International is one of the leading providers of batch- and single wafer wet process solutions for surface treatment of substrates under cleanroom conditions for customers worldwide. Our product portfolio includes manual, semi-automated and fully automated wet process machines perfectly fitting to the requirements of the semiconductor-, MEMS- and micro-structuring industries as well as the R&D sector. Our wet process equipment for cleaning, etching, stripping, plating, e-less and lift-off solutions handle standard as well as innovative semiconductor materials like silicium Si, siliciumcarbid SiC, gallium nitrid GaN, gallium arsenide GaAs, sapphire, glas. Furthermore, we deliver supporting equipment for parts cleaning, chemical media distribution and chemical management. AP&S offers refurbishment programs for used wet process tools like FSI Mercury, Steag and other. Our headquarters is located in Donaueschingen, Germany. The company’s subsidiaries are in China, Singapore and Malaysia.
Whether a standard wet process tool or a customer-specific solution is required:
Our modular product spectrum is tailored to your needs!
We deliver advanced, high-performance wet surface treatment equipment to the industry’s leading semiconductor fabs worldwide. The AP&S wet process range includes manual, semi-automated and fully automated wet process equipment for up to 300mm wafers. The AP&S solutions perfectly cover batch as well as single wafer processing. Etch processes, surface conditioning, resist develop, resist strip, metal lift-off, metal etch, electroless metal deposition, wafer cleaning and drying applications are all included in the AP&S portfolio.
Our hardware is perfectly adapted to the requirements of the microstructuring industry: high throughput, innovative and cost-efficient processing, optimized footprint and most reliable process results are the characteristics of the AP&S wet process equipment.
AP&S offers innovative wet process technologies for wafer processing in the microchip fabrication process, including cleaning, etching, resist strip, resist development, metal etching, electroless metal deposition for Under Bump Metallization, lift-off and wafer drying technologies.
With a wide range of modular wet process equipment using various techniques such as immersion, spin and spray AP&S is well positioned to meet the specific needs of the semiconductor industry.
At the AP&S Demo Center, an in-house laboratory at our German headquarters, we offer wet process demonstrations for wafers, masks and other substrates.
Making a decision for AP&S means, getting a competent, reliable, long-term partner. We offer you much more than just the required semiconductor equipment:
Trust in our competence. As an owner-managed company with a focus on the semiconductor industry and a company history starting in 1995 we offer you extensive experience and reliability.
Our long-lasting experience in creating customer-oriented automation technology, extensive expertise in chemical wet processing and continuous dialogue with our customers – these three decisive aspects form the basis for the efficiency of our products.
Following our goal of continuous development, we invest more than 10% of our annual turnover in research and development. Thereby, the customer benefit is always our pulse. With innovative wet process solutions we want to support the development of new technologies and in this way contribute to our customers’ success.
Highly trained team of process engineers, continuous development of chemical processes in our in-house laboratory “Demo Center” and several partnerships with renowned institutes and chemical suppliers ensure the high quality and efficiency of our wet processes.
Based on the requirements of the semiconductor industry, we follow the principle of continuous development and improvement. Therefore, we invest more than 10% of our annual turnover in research and development. The customer benefit is always our pulse. Which means, by supplying innovative wet process technologies we strive to meet optimally current and future market needs and to contribute to our customers’ success.
We are a team-oriented company, that promotes the independence and creativity of its employees, is breaking new ground, advancing the development of our staff and is looking beyond regional borders thanks to our international orientation. Our working style is characterized by open communication, transparent processes and quick decision-making achieved by a flat hierarchical structure and short communication channels. The community of our employees is the driving force behind our success. It is the individuality and dedication of each individual, that intermesh seamlessly like pieces of a puzzle and create the modern and dynamic working structures of our company.